The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 06, 2010

Filed:

Mar. 30, 2006
Applicants:

Juergen Weber, Kleinostheim, DE;

Tobias Pogge, Muehlheim, DE;

Martin Trommer, Schluechtern, DE;

Bodo Kuehn, Gelnhausen, DE;

Ulrich Kirst, Mainz, DE;

Waltraud Werdecker, Hanau, DE;

Inventors:

Juergen Weber, Kleinostheim, DE;

Tobias Pogge, Muehlheim, DE;

Martin Trommer, Schluechtern, DE;

Bodo Kuehn, Gelnhausen, DE;

Ulrich Kirst, Mainz, DE;

Waltraud Werdecker, Hanau, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C03C 3/06 (2006.01); C03C 3/04 (2006.01); C03C 15/00 (2006.01); C03B 19/00 (2006.01); C03B 21/00 (2006.01); C03B 32/00 (2006.01); C03B 25/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An ideal quartz glass for a wafer jig for use in an environment having an etching effect is distinguished by both high purity and high resistance to dry etching. To indicate a quartz glass that substantially fulfills these requirements, it is suggested according to the invention that the quartz glass is doped with nitrogen at least in a near-surface area, has a mean content of metastable hydroxyl groups of less than 30 wt ppm and that its fictive temperature is below 1250° C. and its viscosity is at least 10dPa·s at a temperature of 1200° C. An economic method for producing such a quartz glass comprises the following method steps: melting an SiOraw material to obtain a quartz glass blank, the SiOraw material or the quartz glass blank being subjected to a dehydration measure, heating the SiOraw material or the quartz glass blank to a nitriding temperature in the range between 1050° C. and 1850° C. in an ammonia-containing atmosphere, a temperature treatment by means of which the quartz glass of the quartz glass blank is set to a fictive temperature of 1250° C. or less, and a surface treatment of the quartz glass blank with formation of the quartz glass jig.


Find Patent Forward Citations

Loading…