The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 06, 2010
Filed:
Mar. 25, 2008
Applicants:
David Hemker, San Jose, CA (US);
Fred C. Redeker, Fremont, CA (US);
John Boyd, Atascadero, CA (US);
John M. DE Larios, Palo Alto, CA (US);
Michael Ravkin, Sunnyvale, CA (US);
Mikhail Korolik, San Jose, CA (US);
Inventors:
David Hemker, San Jose, CA (US);
Fred C. Redeker, Fremont, CA (US);
John Boyd, Atascadero, CA (US);
John M. de Larios, Palo Alto, CA (US);
Michael Ravkin, Sunnyvale, CA (US);
Mikhail Korolik, San Jose, CA (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/26 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for processing a substrate is provided which includes generating a meniscus on the surface of the substrate and applying photolithography light through the meniscus to enable photolithography processing of a surface of the substrate.