The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 2010
Filed:
Feb. 12, 2008
Jun Hatakeyama, Joetsu, JP;
Takao Yoshihara, Joetsu, JP;
Takeshi Kinsho, Joetsu, JP;
Koji Hasegawa, Joetsu, JP;
Yoshio Kawai, Joetsu, JP;
Katsuya Takemura, Joetsu, JP;
Jun Hatakeyama, Joetsu, JP;
Takao Yoshihara, Joetsu, JP;
Takeshi Kinsho, Joetsu, JP;
Koji Hasegawa, Joetsu, JP;
Yoshio Kawai, Joetsu, JP;
Katsuya Takemura, Joetsu, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
A pattern is formed by applying a positive resist composition comprising a polymer comprising 7-oxanorbornane ring-bearing recurring units and acid labile group-bearing recurring units and an acid generator onto a substrate to form a resist film, heat treating and exposing the resist film to radiation, heat treating and developing the resist film with a developer, and causing the resist film to crosslink and cure with the aid of acid and/or heat. A second resist pattern is then formed in the space area of the first resist pattern. The double patterning process reduces the pitch between patterns to one half.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile