The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 2010
Filed:
Dec. 02, 2004
Ryoji Nishio, Kudamatsu, JP;
Ken Yoshioka, Hikari, JP;
Saburou Kanai, Hikari, JP;
Tadamitsu Kanekiyo, Kudamatsu, JP;
Hideki Kihara, Kudamatsu, JP;
Koji Okuda, Kudamatsu, JP;
Ryoji Nishio, Kudamatsu, JP;
Ken Yoshioka, Hikari, JP;
Saburou Kanai, Hikari, JP;
Tadamitsu Kanekiyo, Kudamatsu, JP;
Hideki Kihara, Kudamatsu, JP;
Koji Okuda, Kudamatsu, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A plasma processing apparatus includes a gas ring forming a portion of a vacuum processing chamber and having a blowing port for a processing gas, a bell jar to define a vacuum processing chamber, an antenna for supplying an RF electric field into the vacuum processing chamber to form plasmas, a sample table, a Faraday shield, and a deposition preventive plate attached detachably at least to the inner surface of the gas ring excluding the blowing port. An area of the inner surface of the gas ring including the deposition preventive plate that can be viewed from the sample surface is set to about ½ or more of the area of the sample. A susceptor made of a dielectric material covers the outer surface and the outer lateral side of the sample table. A metal film is disposed with respect to the susceptor, and an RF voltage is applied to the metal film.