The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2010
Filed:
Nov. 27, 2007
Masahiro Numakura, Yamanashi, JP;
Masahiro Numakura, Yamanashi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
Depending on the degree of microfabrication requested for each wafer lot, transfer of wafers is controlled. A substrate processing apparatus includes a plurality of PMsand an LLMand is controlled by an ECThe ECincludes a selection unitand a transfer control unitThe unitselects the PM to which the next wafer is to be transferred, and selects, for each lot, whether the wafers are transferred to the same PM in one-lot units or in one-substrate units depending on the degree of the microfabrication requested for each lot. When the wafer transfer in lot units is selected, the unitsequentially transfers the wafers included in the lot to the selected PM. Otherwise the unitsequentially OR transfers the wafers included in the lot from the selected PM to a different PM one by one.