The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2010
Filed:
Feb. 08, 2007
Masahiro Hashimoto, Shinjuku-ku, JP;
Tomoyuki Enomoto, Toyama, JP;
Takahiro Sakaguchi, Toyama, JP;
Rikimaru Sakamoto, Toyama, JP;
Masaki Nagai, Chiyoda-ku, JP;
Masahiro Hashimoto, Shinjuku-ku, JP;
Tomoyuki Enomoto, Toyama, JP;
Takahiro Sakaguchi, Toyama, JP;
Rikimaru Sakamoto, Toyama, JP;
Masaki Nagai, Chiyoda-ku, JP;
Hoya Corporation, Tokyo, JP;
Nissan Chemical Industries, Ltd., Tokyo, JP;
Abstract
There is provided a resist underlayer coating forming composition used in processes for manufacturing a mask blank and a mask, and a mask blank and a mask manufactured from the composition. The resist underlayer coating forming composition comprises a polymer compound having a halogen atom-containing repeating structural unit and a solvent. In a mask blank including a thin film for forming transfer pattern and a chemically-amplified type resist coating on a substrate in that order, the composition is used for forming a resist underlayer coating between the thin film for forming transfer pattern and the resist coating. The polymer compound is preferably a compound containing a halogen atom in an amount of at least 10 mass %.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile