The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2010
Filed:
Sep. 14, 2005
Keith A. Miller, Sunnyvale, CA (US);
Anantha K. Subramani, San Jose, CA (US);
Maurice E. Ewert, San Jose, CA (US);
Tza-jing Gung, San Jose, CA (US);
Hong S. Yang, Pleasanton, CA (US);
Vincent E. Burkhart, San Jose, CA (US);
Keith A. Miller, Sunnyvale, CA (US);
Anantha K. Subramani, San Jose, CA (US);
Maurice E. Ewert, San Jose, CA (US);
Tza-Jing Gung, San Jose, CA (US);
Hong S. Yang, Pleasanton, CA (US);
Vincent E. Burkhart, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A continuously variable multi-position magnetron that is rotated about a central axis in back of a sputtering target at a freely selected radius. The position is dynamically controlled from the outside, for example, through a hydraulic actuator connected between a pivoting arm supporting the magnetron and an arm fixed to the shaft, by two coaxial shafts independent controllable from the outside and supporting the magnetron through a frog-leg mechanism, or a cable connected between the pivoting arms and moved by an external slider. The magnetron can be rotated at two, three, or more discrete radii or be moved in a continuous spiral pattern.