The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 2010
Filed:
Nov. 30, 2007
Christopher Kimball, Fremont, CA (US);
Eric Hudson, Berkeley, CA (US);
Douglas Keil, Fremont, CA (US);
Alexei Marakhtanov, Albany, CA (US);
Christopher Kimball, Fremont, CA (US);
Eric Hudson, Berkeley, CA (US);
Douglas Keil, Fremont, CA (US);
Alexei Marakhtanov, Albany, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A plasma processing chamber with a probe apparatus configured to measure a set of electrical characteristics in a plasma is disclosed. The plasma processing chamber includes a set of plasma chamber surfaces configured to be exposed to the plasma. The probe apparatus includes a collection disk structure configured to be exposed to the plasma, whereby the collection disk structure is coplanar with at least one of the set of plasma chamber surfaces. The probe apparatus also includes a conductive path configured to transmit the set of electrical characteristics from the collection disk structure to a set of transducers.