The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 2010
Filed:
Nov. 03, 2006
Tadahiro Ohmi, Sendai, JP;
Masaki Hirayama, Sendai, JP;
Takahiro Horiguchi, Tsukui, JP;
Tohoku University, Sendai-shi, JP;
Future Vision Inc., Tokyo, JP;
Abstract
The purpose of the present invention is to provide homogeneous plasma in longitudinal direction of a plasma processing apparatus applicable to multiple processes. A microwave waveguidewith a plurality of variable couplersis placed in a vacuum chamber. The microwave generated in a microwave generatoris introduced into the microwave waveguidevia a waveguide. And a plasmain the chamberis generated by the microwave. Intensity distribution of the microwavein the microwave waveguidecan be varied by moving a plurality of variable couplersindividually upward or downward as shown by two-way arrow.