The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2010
Filed:
Jan. 13, 2005
Andreas Dorsel, Aalen, DE;
Toralf Gruner, Aalen-Hofen, DE;
Bernhard Kneer, Altheim, DE;
Susanne Beder, Aalen, DE;
Alexander Epple, Aalen, DE;
Norbert Wabra, Werneck, DE;
Andreas Dorsel, Aalen, DE;
Toralf Gruner, Aalen-Hofen, DE;
Bernhard Kneer, Altheim, DE;
Susanne Beder, Aalen, DE;
Alexander Epple, Aalen, DE;
Norbert Wabra, Werneck, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
Imaging system of a microlithographic projection exposure apparatus, with a projection objective () that serves to project an image of a mask which can be set into position in an object plane onto a light-sensitive coating layer which can be set into position in an image plane, and with a liquid-delivery device () serving to fill immersion liquid () into an interstitial space between the image plane and a last optical element () on the image-plane side of the projection objective; wherein the last optical element on the image-plane side of the projection objective is arranged so that, seen in the direction of gravity, it follows the image plane; and wherein the projection objective is configured in such a way that when the system is operating with immersion, the immersion liquid has at least in some areas a convex-curved surface facing in the direction away from the image plane. It is also proposed for the last optical element () on the image-plane side of the projection objective to be arranged below the image plane in such a way that the immersion liquid () is held at least in part in a substantially tub-shaped area on the last optical element on the image-plane side. Also, a rotator can be provided which serves to rotate a substrate carrying the light-sensitive coating () between a transport orientation in which the light-sensitive coating lies on a substrate surface that faces against the direction of gravity and an exposure orientation in which the light-sensitive coating () lies on a substrate surface that faces in the direction of gravity.