The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2010
Filed:
Sep. 13, 2004
Jess Koehler, Immenstaad, DE;
Johannes Wangler, Koenigsbronn, DE;
Markus Brotsack, Aalen, DE;
Wolfgang Singer, Aalen, DE;
Damian Fiolka, Oberkochen, DE;
Manfred Maul, Aalen, DE;
Jess Koehler, Immenstaad, DE;
Johannes Wangler, Koenigsbronn, DE;
Markus Brotsack, Aalen, DE;
Wolfgang Singer, Aalen, DE;
Damian Fiolka, Oberkochen, DE;
Manfred Maul, Aalen, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (). The illumination system has a light distribution device () which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface () of the illumination system. The light distribution device has at least one optical modulation device () having a two-dimensional array of individual elements () that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.