The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 2010
Filed:
Oct. 09, 2007
Kaoru Sakai, Yokohama, JP;
Shunji Maeda, Yokohama, JP;
Takafumi Okabe, Yokohama, JP;
Hiroshi Goto, Ushiku, JP;
Masayuki Kuwabara, Machida, JP;
Naoya Takeuchi, Tokyo, JP;
Kaoru Sakai, Yokohama, JP;
Shunji Maeda, Yokohama, JP;
Takafumi Okabe, Yokohama, JP;
Hiroshi Goto, Ushiku, JP;
Masayuki Kuwabara, Machida, JP;
Naoya Takeuchi, Tokyo, JP;
Hitachi, Ltd., , JP;
Abstract
A pattern inspection method including: sequentially imaging plural chips formed on a substrate; selecting a pattern which is suitable for calculating position gap between an inspection image of a subject chip and reference image stored in memory from an image of a firstly imaged chip among said sequentially imaged plural chips formed on the substrate; computing position gap between an inspection image of a chip obtained by the sequential imaging and reference image stored in a memory by using a positional information of a pattern image included in the inspection image and a reference pattern image included in the reference image which are both corresponding to the pattern selected at the selecting; aligning the inspection image and the reference image by using information of the calculated position gap; and comparing the aligned inspection image with the reference image and extracting a difference as a defect candidate.