The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 2010
Filed:
Apr. 05, 2007
Erik Roelof Loopstra, Heeze, NL;
Henrikus Herman Marie Cox, Eindhoven, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Wilhelmus Franciscus Johannes Simons, Beesel, NL;
Paul Petrus Joannes Berkvens, Veldhoven, NL;
Erik Roelof Loopstra, Heeze, NL;
Henrikus Herman Marie Cox, Eindhoven, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Wilhelmus Franciscus Johannes Simons, Beesel, NL;
Paul Petrus Joannes Berkvens, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A position control system for a substrate support of a lithographic apparatus includes a position measurement system configured to determine a position of a sensor or sensor target on the substrate support, a controller configured to provide a control signal based on a desired position of a target portion of the substrate and the determined position, and one or more actuators configured to act on the substrate support. The position control system includes a stiffness compensation model of the substrate support, the stiffness compensation model including a relation between a difference in a change in position of the target portion and a change in position of the sensor or sensor target as a result of a force exerted on the substrate support. The position control system is configured to substantially correct at least during projection of a patterned radiation beam on the target portion, the position of the target portion using the stiffness compensation model.