The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2010
Filed:
Nov. 13, 2007
Applicants:
Xuedong Liu, Cupertino, CA (US);
Zhonghua Dong, Sunnyvale, CA (US);
Wei Fang, Milpitas, CA (US);
Zhong-wei Chen, San Jose, CA (US);
Inventors:
Xuedong Liu, Cupertino, CA (US);
Zhonghua Dong, Sunnyvale, CA (US);
Wei Fang, Milpitas, CA (US);
Zhong-Wei Chen, San Jose, CA (US);
Assignee:
Hermes Microvision, Inc. (Taiwan), Hsin-Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01); H01J 37/21 (2006.01); H01J 3/14 (2006.01);
U.S. Cl.
CPC ...
Abstract
This invention relates to apparatus and method to fast determine focus parameters in one pre-scan during an e-beam inspection practice. More specifically, embodiments of the present invention provide an apparatus and method that provide accurate focus tuning after primary focusing has been done.