The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2010
Filed:
Sep. 27, 2007
Applicants:
Ralf Richter, Dresden, DE;
Heike Salz, Radebeul, DE;
Matthias Schaller, Moritzburg, DE;
Inventors:
Assignee:
GlobalFoundries, Inc., Grand Cayman, KY;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
Abstract
During the patterning of respective contact etch stop layers having a different type of intrinsic stress, the deposition of an etch indicator layer between the first and the second contact etch stop layer may be omitted in order to avoid any undue effects of this layer during the subsequent processing. Local removal of the second stressed layer may be performed on the basis of an etch time controlled etch process, which in some aspects may include the provision of an etch indicator material, wherein feed forward and feed back measurement data may be used in an appropriately designed process controller.