The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 13, 2010

Filed:

Apr. 18, 2005
Applicant:

Yusuke Kohyama, Poughkeepsie, NY (US);

Inventor:

Yusuke Kohyama, Poughkeepsie, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 31/00 (2006.01); H01L 29/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

A device, and method for manufacturing the same, including a PFET having an embedded SiGe layer where a shallow portion of the SiGe layer is closer to the PFET channel and a deep portion of the SiGe layer is further from the PFET channel. Thus, the SiGe layer has a boundary on the side facing toward the channel that is tapered. Such a configuration may allow the PFET channel to be compressively stressed by a large amount without necessarily substantially degrading extension junction characteristics. The tapered SiGe boundary may be configured as a plurality of discrete steps. For example, two, three, or more discrete steps may be formed.


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