The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 2010
Filed:
Mar. 08, 2007
Applicants:
Chuan-hsien Fu, Taipei County, TW;
Chuen-huei Yang, Taipei, TW;
Chien-li Kuo, Hsinchu, TW;
Shu-ru Wang, Taichung County, TW;
Yu-lin Wang, Taipei, TW;
Inventors:
Chuan-Hsien Fu, Taipei County, TW;
Chuen-Huei Yang, Taipei, TW;
Chien-Li Kuo, Hsinchu, TW;
Shu-Ru Wang, Taichung County, TW;
Yu-Lin Wang, Taipei, TW;
Assignee:
United Microelectronics Corp., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention provides a mask pattern. The mask pattern comprises at least a continuous pattern. Each of the continuous patterns has a first pattern, a second pattern and a set of assistance patterns. The assistant patterns are located between the first pattern to the second pattern. The first pattern, the assistant patterns and the second pattern together form a closed opening.