The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 23, 2010

Filed:

Dec. 18, 2003
Applicants:

Hermann Bieg, Aalen, DE;

Thomas Bischoff, Aalen, DE;

Uy-liem Nguyen, Dattwill, CH;

Stefan Xalter, Oberkochen, DE;

Marcus Will, Neu-Ulm, DE;

Yim-bum Patrick Kwan, Aalen, DE;

Michael Muehlbeyer, Aalen, DE;

Inventors:

Hermann Bieg, Aalen, DE;

Thomas Bischoff, Aalen, DE;

Uy-Liem Nguyen, Dattwill, CH;

Stefan Xalter, Oberkochen, DE;

Marcus Will, Neu-Ulm, DE;

Yim-Bum Patrick Kwan, Aalen, DE;

Michael Muehlbeyer, Aalen, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention relates to an optical imaging device, in particular an objectivefor microlithography in the field of EUVL for producing semiconductor components, having a beam path, a plurality of optical elementsand a diaphragm devicewith an adjustable diaphragm opening shape. The diaphragm device has a diaphragm storewith a plurality of different diaphragm openingswith fixed shapes in each case, which can be introduced into the beam path


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