The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2010
Filed:
Mar. 29, 2006
Johannes Henricus Wilhelmus Jacobs, Eindhoven, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Barrie Dudley Brewster, Brighton, GB;
Vladimir Vitalevitch Ivanov, Moscow, RU;
Bastiaan Matthias Mertens, 's-Gravenhage, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Robert Gordon Livesey, Cuckfield, GB;
Bastiaan Theodoor Wolschrijn, Abcoude, NL;
Johannes Henricus Wilhelmus Jacobs, Eindhoven, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Barrie Dudley Brewster, Brighton, GB;
Vladimir Vitalevitch Ivanov, Moscow, RU;
Bastiaan Matthias Mertens, 's-Gravenhage, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Robert Gordon Livesey, Cuckfield, GB;
Bastiaan Theodoor Wolschrijn, Abcoude, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus is configured to project a pattern from a patterning device onto a substrate. The apparatus includes a gas purged sealing aperture extending between at least two different zones of the apparatus, and a gas supplier configured to supply the sealing aperture one or more gases selected from a group including hydrogen, deuterium, heavy hydrogen, deuterated hydrogen, and a mixture of argon and hydrogen.