The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2010
Filed:
Oct. 20, 2004
Hideo Hada, Kawasaki, JP;
Masaru Takeshita, Kawasaki, JP;
Ryotaro Hayashi, Kawasaki, JP;
Syogo Matsumaru, Kawasaki, JP;
Taku Hirayama, Kawasaki, JP;
Hiroaki Shimizu, Kawasaki, JP;
Hideo Hada, Kawasaki, JP;
Masaru Takeshita, Kawasaki, JP;
Ryotaro Hayashi, Kawasaki, JP;
Syogo Matsumaru, Kawasaki, JP;
Taku Hirayama, Kawasaki, JP;
Hiroaki Shimizu, Kawasaki, JP;
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;
Abstract
A resist composition is provided that yields fine resolution, and improved levels of line edge roughness and depth of focus. This composition includes a resin component (A) that undergoes a change in alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure, wherein the component (A) is a resin with a weight average molecular weight of no more than 8,000 containing structural units (a) derived from a (meth)acrylate ester, and the component (B) includes at least one sulfonium compound represented by a general formula (b-1) or a general formula (b-2) shown below.