The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 16, 2010

Filed:

Sep. 06, 2007
Applicants:

Boris Yokhin, Nazareth Illit, IL;

Alexander Tokar, Haifa, IL;

Alexander Krokhmal, Haifa, IL;

Asher Peled, Even Yehuda, IL;

Dileep Agnihotri, Round Rock, TX (US);

Inventors:

Boris Yokhin, Nazareth Illit, IL;

Alexander Tokar, Haifa, IL;

Alexander Krokhmal, Haifa, IL;

Asher Peled, Even Yehuda, IL;

Dileep Agnihotri, Round Rock, TX (US);

Assignee:

Jordan Valley Semiconductors Ltd., Migdal Ha'emek, IL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/223 (2006.01); G01N 23/201 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for analyzing a sample includes directing one or more beams of X-rays to impinge on an area of a surface of the sample on which a layer of nano-particles of a selected element has been formed. Secondary X-ray radiation from the area is detected responsively to the one or more beams. A distribution of the nano-particles on the surface is characterized based on the detected radiation.


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