The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 2010
Filed:
Sep. 13, 2006
Kallol Bera, San Jose, CA (US);
Daniel Hoffman, Saratoga, CA (US);
Yan YE, Saratoga, CA (US);
Michael Kutney, Santa Clara, CA (US);
Douglas A. Buchberger, Livermore, CA (US);
Kallol Bera, San Jose, CA (US);
Daniel Hoffman, Saratoga, CA (US);
Yan Ye, Saratoga, CA (US);
Michael Kutney, Santa Clara, CA (US);
Douglas A. Buchberger, Livermore, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
The embodiments of the present invention generally relate to a plasma reactor. In one embodiment, a plasma reactor includes a substrate support is disposed in a vacuum chamber body and coupled to bias power generator. An RF electrode is disposed above the substrate support and coupled to a very high frequency power generator. A conductive annular ring is disposed on the substrate support and has a lower outer wall, an upper outer wall and an inner wall. A step is extends upward and outward from a lower outer wall and inward and downward from the upper outer wall. The inner wall disposed opposite the upper and lower outer wall. In other embodiments, the annular ring may be fabricated from a conductive material, such as silicon carbide and aluminum.