The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 2010
Filed:
Jun. 06, 2007
Michael E. Adel, Zichron Ya'akov, IL;
Vladimir Levinski, Nazareth Iilt, IL;
Elyakim Kassel, Misgav, IL;
Michael E. Adel, Zichron Ya'akov, IL;
Vladimir Levinski, Nazareth Iilt, IL;
Elyakim Kassel, Misgav, IL;
KLA-Tencor Technologies Corporation, Milpitas, CA (US);
Abstract
The present invention is directed to novel metrology marks and methods for their use. The marks comprise cross hashed overlay metrology marks formed on a substrate including a plurality of target regions. The mark including a first grating structure formed in one layer of a target region and including a second grating structure formed in another layer of the target region. The periodic features of the first and second grating structures are oriented substantially orthogonal one another to form a cross-hatched metrology target in the target region. Additionally, the patent discloses methods of employing the metrology marks to obtain overlay metrology measurements.