The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 2010
Filed:
Oct. 10, 2006
Dirk Heinrich Ehm, Aalen, DE;
Johannes Hubertus Josephina Moors, Helmond, NL;
Bastiaan Theodoor Wolschrijn, Abcoude, NL;
Marcus Gerhardus Hendrikus Meijerink, The Hague, NL;
Thomas Stein, Oberkochen, DE;
Dirk Heinrich Ehm, Aalen, DE;
Johannes Hubertus Josephina Moors, Helmond, NL;
Bastiaan Theodoor Wolschrijn, Abcoude, NL;
Marcus Gerhardus Hendrikus Meijerink, The Hague, NL;
Thomas Stein, Oberkochen, DE;
ASML Netherlands B.V., Veldhoven, NL;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
A method to clean optical elements of an apparatus, the apparatus being configured to project a beam of radiation onto a target portion of a substrate, the apparatus comprising a plurality of optical elements arranged in sequence in the path of the radiation beam, wherein the cleaning method comprises: cleaning one or more second optical elements of the sequence, which receive one or more relatively low second radiation doses during operation of the apparatus, utilizing cumulatively shorter cleaning periods than one or more first optical elements of the sequence that receive one or more first radiation doses during operation of the apparatus, a second radiation dose being lower than each relatively high first radiation dose.