The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 2010
Filed:
Oct. 18, 2006
Jozef Maria Finders, Veldhoven, NL;
Johannes Anna Quaedackers, Veldhoven, NL;
Judocus Marie Dominicus Stoeldraijer, Bladel, NL;
Johannes Wilhelmus DE Klerk, Eindhoven, NL;
Alexander Serebryakov, Hertogenbosch, NL;
Jozef Maria Finders, Veldhoven, NL;
Johannes Anna Quaedackers, Veldhoven, NL;
Judocus Marie Dominicus Stoeldraijer, Bladel, NL;
Johannes Wilhelmus De Klerk, Eindhoven, NL;
Alexander Serebryakov, Hertogenbosch, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method for improving the uniformity of a lithographic process. In one aspect, the probability density function of a first and second lithographic apparatus are matched by providing a continuous z-motion to a stage in the first lithographic apparatus during substrate exposure. Preferably, the z-motion is characterized by a normally distributed function, wherein the effective probability density function of the first apparatus is substantially similar to the probability density function of the second apparatus.