The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2010
Filed:
Feb. 14, 2006
Fransicus Mathijs Jacobs, Asten, NL;
Erik Roelof Loopstra, Heeze, NL;
Harmen Klaas Van Der Schoot, Vught, NL;
Arjan Franklin Bakker, Helenaveen, NL;
Arjan Martin Van Der Wel, Eindhoven, NL;
Krijn Frederik Bustraan, Eindhoven, NL;
Marcel Koenraad Marie Baggen, Nuenen, NL;
Fransicus Mathijs Jacobs, Asten, NL;
Erik Roelof Loopstra, Heeze, NL;
Harmen Klaas Van der Schoot, Vught, NL;
Arjan Franklin Bakker, Helenaveen, NL;
Arjan Martin Van der Wel, Eindhoven, NL;
Krijn Frederik Bustraan, Eindhoven, NL;
Marcel Koenraad Marie Baggen, Nuenen, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes a support constructed to support a patterning device. The patterning device is capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. The support includes a force actuator device to exert a force onto the patterning device in a direction of movement of the support. The force actuator device includes a movable part which is pivotably about a pivot axis and thereby connected to the support. The movable part is in the direction of movement of the support substantially balanced with respect to the pivot axis. The force actuator device further includes an actuator to exert via the movable part the force onto the patterning device, to at least partly compensate for the information or a risk of slippage due to acceleration of the support in the direction of movement.