The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2010
Filed:
Aug. 25, 2005
Philip D. Schumaker, Austin, TX (US);
Angelo Fancello, Austin, TX (US);
Jae H. Kim, Austin, TX (US);
Byung-jin Choi, Austin, TX (US);
Daniel A. Babbs, Austin, TX (US);
Philip D. Schumaker, Austin, TX (US);
Angelo Fancello, Austin, TX (US);
Jae H. Kim, Austin, TX (US);
Byung-Jin Choi, Austin, TX (US);
Daniel A. Babbs, Austin, TX (US);
Molecular Imprints, Inc., Austin, TX (US);
Abstract
The present is directed towards an imprint lithography system including, inter alia, a docking plate; a motion stage having a range of motion associated therewith, the range of motion having a periphery spaced-apart from the docking plate a first distance; and a body, having first and second opposed sides spaced-apart a second distance, selectively coupled between the docking plate and the motion stage, the first distance being greater than the second distance to minimize a probability of a collision between the docking plate, the motion stage and the body while transferring the body between the docking plate and the motion stage.