The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2010
Filed:
Jan. 17, 2007
Takahiro Horiguchi, Kanagawa, JP;
Takahiro Horiguchi, Kanagawa, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
At a framein a microwave plasma processing apparatus, numerous horizontal spray gas nozzlesformed therein injection holes A and numerous vertical gas nozzlesformed therein injection holes B are fixed. A first gas supply meansinjects argon gas through the injection holes A into an area near each dielectric parts. A second gas supply meansinjects silane gas and hydrogen gas through the injection holes B into a position at which the gases do not become over-dissociated. The gases injected as described above are raised to plasma with a microwave transmitted through each dielectric parts. Since the vertical gas nozzlesare mounted at positions at which they do not block the flow of plasma traveling toward a substrate G, ions and electrons do not collide with the vertical gas nozzlesreadily.