The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2010
Filed:
May. 18, 2005
Minoru Yoshida, Yokohama, JP;
Shunji Maeda, Yokohama, JP;
Atsushi Shimoda, Hiratsuka, JP;
Kaoru Sakai, Yokohama, JP;
Takafumi Okabe, Yokohama, JP;
Masahiro Watanabe, Yokohama, JP;
Minoru Yoshida, Yokohama, JP;
Shunji Maeda, Yokohama, JP;
Atsushi Shimoda, Hiratsuka, JP;
Kaoru Sakai, Yokohama, JP;
Takafumi Okabe, Yokohama, JP;
Masahiro Watanabe, Yokohama, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A pattern inspection apparatus includes a light source which emits ultraviolet light, an irradiator which reduces coherency of the ultraviolet light and irradiates the coherency reduced ultraviolet light onto a specimen on which a pattern is formed through an objective lens, and a focus control means which projects light on the specimen from outside the objective lens, detects light reflected from the specimen by the projection and adjusts a height of the specimen relative to the objective lens. The apparatus further includes an image which forms an image of the specimen irradiated with the ultraviolet light and detects the formed image with a sensor, an image processor which processes a signal outputted from the sensor to detect a defect of the specimen, and a display which displays information of the defect detected by the image processor.