The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2010
Filed:
Apr. 24, 2006
Alexander Paterson, San Jose, CA (US);
Valentin N. Todorow, Palo Alto, CA (US);
Theodoros Panagopoulos, San Jose, CA (US);
Brian K. Hatcher, San Jose, CA (US);
Dan Katz, Saratoga, CA (US);
Edward P. Hammond, Iv, Hillsborough, CA (US);
John P. Holland, San Jose, CA (US);
Alexander Matyushkin, San Jose, CA (US);
Alexander Paterson, San Jose, CA (US);
Valentin N. Todorow, Palo Alto, CA (US);
Theodoros Panagopoulos, San Jose, CA (US);
Brian K. Hatcher, San Jose, CA (US);
Dan Katz, Saratoga, CA (US);
Edward P. Hammond, IV, Hillsborough, CA (US);
John P. Holland, San Jose, CA (US);
Alexander Matyushkin, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A plasma reactor for processing a workpiece includes a reactor chamber and a workpiece support within the chamber, the chamber having a ceiling facing the workpiece support, a capacitively coupled plasma source power applicator comprising a source power electrode at one of: (a) the ceiling (b) the workpiece support, and plural VHF power generators of different fixed frequencies coupled to the capacitively coupled source power applicator, and a controller for independently controlling the power output levels of the plural VHF generators so as to control an effective VHF frequency applied to the source power electrode. In a preferred embodiment, the reactor further includes a plasma bias power applicator that includes a bias power electrode in the workpiece support and one or more RF bias power generators of different frequencies coupled to the plasma bias power applicator.