The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2010
Filed:
Jun. 01, 2006
Jaw-jung Shin, Hsin-Chu, TW;
King-chang Shu, Taipei, TW;
Jan-wen You, Jhongli, TW;
Tsai-sheng Gau, Hsin-Chu, TW;
Jaw-Jung Shin, Hsin-Chu, TW;
King-Chang Shu, Taipei, TW;
Jan-Wen You, Jhongli, TW;
Tsai-Sheng Gau, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
Disclosed is a method and a system for identifying lens aberration sensitive patterns in an integrated circuit chip. A first simulation of a layout is performed to simulate a contour without lens aberration. A second simulation is performed of the layout to simulate a contour with lens aberration. A difference of critical dimension is determined between the contours with and without lens aberration, and at least one lens aberration sensitive pattern is selected from a plurality of layouts based on the difference in critical dimension.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile