The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 15, 2009

Filed:

May. 28, 2004
Applicants:

Toshio Goto, Nisshin-shi, Aichi, JP;

Masaru Hori, Nisshin-shi, Aichi, JP;

Nobuo Ishii, Kobe, JP;

Shoji Den, Kawasaki, JP;

Inventors:

Toshio Goto, Nisshin-shi, Aichi, JP;

Masaru Hori, Nisshin-shi, Aichi, JP;

Nobuo Ishii, Kobe, JP;

Shoji Den, Kawasaki, JP;

Assignees:

Other;

Tokyo Electron Limited, Minato-ku, Tokyo, JP;

Katagiri Engineering Co., Ltd., Kawasaki-shi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23F 1/00 (2006.01); H01L 21/306 (2006.01); C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A plasma source () is composed of a chamber () to which a gas should be supplied and a hollow cathode electrode member () which is arranged on the gas flow-out side of the chamber () and has a plurality of electrode holes () through which the gas can flow. In such a plasma source (), microcathode plasma discharge can be performed in the electrode holes () of the hollow cathode electrode member ().


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