The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2009
Filed:
Nov. 30, 2004
Pawan Kumar Nimmakayala, Austin, TX (US);
Tom H. Rafferty, Austin, TX (US);
Alireza Aghili, Austin, TX (US);
Byung-jin Choi, Austin, TX (US);
Philip D. Schumaker, Austin, TX (US);
Daniel A. Babbs, Austin, TX (US);
Van N. Truskett, Austin, TX (US);
Pawan Kumar Nimmakayala, Austin, TX (US);
Tom H. Rafferty, Austin, TX (US);
Alireza Aghili, Austin, TX (US);
Byung-Jin Choi, Austin, TX (US);
Philip D. Schumaker, Austin, TX (US);
Daniel A. Babbs, Austin, TX (US);
Van N. Truskett, Austin, TX (US);
Molecular Imprints, Inc., Austin, TX (US);
Abstract
The present invention features a method to determine relative spatial parameters between two coordinate systems, which may be a mold and a region of a substrate in which mold is employed to generate a pattern. The method includes sensing relative alignment between the two coordinate systems at multiple points and determines relative spatial parameters therebetween. The relative spatial parameters include a relative area and a relative shape.