The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2009
Filed:
Nov. 28, 2006
Willibrordus Gerardus Maria Van Den Hoek, Saratoga, CA (US);
Nerissa S. Draeger, Milpitas, CA (US);
Raashina Humayun, Sunnyvale, CA (US);
Richard S. Hill, Atherton, CA (US);
Jianing Sun, Fremont, CA (US);
Gary Ray, Mountain View, CA (US);
Willibrordus Gerardus Maria van den Hoek, Saratoga, CA (US);
Nerissa S. Draeger, Milpitas, CA (US);
Raashina Humayun, Sunnyvale, CA (US);
Richard S. Hill, Atherton, CA (US);
Jianing Sun, Fremont, CA (US);
Gary Ray, Mountain View, CA (US);
Novellus Systems, Inc., San Jose, CA (US);
Abstract
Porous dielectric layers are produced by introducing pores in pre-formed composite dielectric layers. The pores may be produced after the barrier material, the metal or other conductive material is deposited to form a metallization layer. In this manner, the conductive material is provided with a relatively smooth continuous surface on which to deposit.