The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2009
Filed:
Apr. 07, 2008
Christophe Pierrat, Santa Clara, CA (US);
Michel Luc Cote, San Jose, CA (US);
Christophe Pierrat, Santa Clara, CA (US);
Michel Luc Cote, San Jose, CA (US);
Synopsys, Inc., Mountain View, CA (US);
Abstract
Mask and integrated circuit fabrication approaches are described to facilitate use of so called 'full phase' masks. This facilitates use of masks where substantially all of a layout is defined using phase shifting. In one embodiment, the phase shifting mask and the trim mask are exposed using substantially the same exposure conditions. These approaches facilitate better exposure profiles for the resulting ICs and can thus improve chip yield and increase throughput by reducing the need to alter settings and/or switch reticles between exposures.