The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2009
Filed:
Oct. 24, 2007
Applicants:
Takeru Watanabe, Joetsu, JP;
Youichi Ohsawa, Joetsu, JP;
Masaki Ohashi, Joetsu, JP;
Wataru Kusaki, Joetsu, JP;
Tomohiro Kobayashi, Joetsu, JP;
Inventors:
Takeru Watanabe, Joetsu, JP;
Youichi Ohsawa, Joetsu, JP;
Masaki Ohashi, Joetsu, JP;
Wataru Kusaki, Joetsu, JP;
Tomohiro Kobayashi, Joetsu, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
Abstract
A resist composition comprising as a quencher a nitrogen-containing organic compound bearing a nitrogen-containing heterocycle and having a molecular weight of at least 380 exhibits a high resolution and satisfactory mask coverage dependence and is useful in microfabrication using electron beam or deep-UV.