The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 2009
Filed:
May. 07, 2007
Xuguang Wang, Sunnyvale, CA (US);
Yi He, Fremont, CA (US);
Zhizheng Liu, San Jose, CA (US);
Sung-yong Chung, Santa Clara, CA (US);
Darlene G. Hamilton, White Salmon, WA (US);
Ashot Melik-martirosian, Sunnyvale, CA (US);
Gulzar Kathawala, Santa Clara, CA (US);
Ming Sang Kwan, San Leandro, CA (US);
Mark Randolph, San Jose, CA (US);
Timothy Thurgate, Sunnyvale, CA (US);
Xuguang Wang, Sunnyvale, CA (US);
Yi He, Fremont, CA (US);
Zhizheng Liu, San Jose, CA (US);
Sung-Yong Chung, Santa Clara, CA (US);
Darlene G. Hamilton, White Salmon, WA (US);
Ashot Melik-Martirosian, Sunnyvale, CA (US);
Gulzar Kathawala, Santa Clara, CA (US);
Ming Sang Kwan, San Leandro, CA (US);
Mark Randolph, San Jose, CA (US);
Timothy Thurgate, Sunnyvale, CA (US);
Spansion LLC, Sunnyvale, CA (US);
Abstract
Erasing wordlines at the same time can cause undesirable results because some wordlines are affected by electromagnetic waves of other wordlines. However, other wordlines are not affected because they are next to contacts. Therefore, it can be beneficial to erase wordlines in a multi-phase sequence that allows for erasing wordlines without an impact from other wordlines.