The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 2009
Filed:
Jun. 16, 2008
Andre Bernardus Jeunink, Bergeyk, NL;
M'hamed Akhssay, Helmond, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Franciscus Antonius Chrysogonus Marie Commissaris, Waalre, NL;
Simon DE Groot, Eindhoven, NL;
Wim Tjibbo Tel, Helmond, NL;
Alexander Hendrikus Martinus Van Der Hoff, Valkenswaard, NL;
Arnout Van DE Stadt, Eindhoven, NL;
Remco Marcel Van Dijk, Eindhoven, NL;
Andre Bernardus Jeunink, Bergeyk, NL;
M'hamed Akhssay, Helmond, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Franciscus Antonius Chrysogonus Marie Commissaris, Waalre, NL;
Simon De Groot, Eindhoven, NL;
Wim Tjibbo Tel, Helmond, NL;
Alexander Hendrikus Martinus Van der Hoff, Valkenswaard, NL;
Arnout Van de Stadt, Eindhoven, NL;
Remco Marcel Van Dijk, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus is disclosed that includes a predictive system configured to predict changes in projection system aberrations with time with respect to measured aberration values, a modelling system configured to determine an application-specific effect of said predicted projection system aberration changes on at least one parameter of an image for a selected pattern, a control system configured to generate a control signal specific to the selected pattern according to said predicted projection system aberration changes and their application-specific effect on the at least one parameter of the image, and an image adjusting system, responsive to the control signal, to compensate for the application-specific effect of said predicted projection system aberration changes on the image.