The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 2009
Filed:
Mar. 27, 2003
Applicants:
Thomas Feudel, Radebeul, DE;
Manfred Horstmann, Dresden, DE;
Rolf Stephan, Dresden, DE;
Inventors:
Assignee:
Advanced Micro Devices, Inc., Austin, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of forming the halo structures of a field effect transistor is disclosed. The halo structures are formed by implanting ions of a dopant material into the substrate on which the transistor is to be formed, wherein the tilt angle of the ion beam with respect to the surface of the substrate is varied according to a predefined time schedule comprising a plurality of implanting periods.