The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2009
Filed:
May. 03, 2006
Kallol Bera, San Jose, CA (US);
Daniel Hoffman, Saratoga, CA (US);
Yan YE, Saratoga, CA (US);
Michael Kutney, Santa Clara, CA (US);
Douglas A. Buchberger, Livermore, CA (US);
Kallol Bera, San Jose, CA (US);
Daniel Hoffman, Saratoga, CA (US);
Yan Ye, Saratoga, CA (US);
Michael Kutney, Santa Clara, CA (US);
Douglas A. Buchberger, Livermore, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
The embodiments of the present invention generally relate to annular ring used in a plasma processing chamber. In one embodiment, the annular ring includes an inner wall, an upper outer wall, a lower outer wall, a step defined between the upper and lower outer wall, a top surface and a bottom wall. The step is formed upward and outward from the lower outer wall and inward and downward from the upper outer wall. The annular ring may be fabricated from a conductive material, such as silicon carbide and aluminum.