The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2009
Filed:
Apr. 01, 2004
Applicants:
Mikhail Korolik, San Jose, CA (US);
John M. DE Larios, Palo Alto, CA (US);
Mike Ravkin, Sunnyvale, CA (US);
Jeffrey Farber, Delmar, NY (US);
Inventors:
Mikhail Korolik, San Jose, CA (US);
John M. de Larios, Palo Alto, CA (US);
Mike Ravkin, Sunnyvale, CA (US);
Jeffrey Farber, Delmar, NY (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for processing a substrate is provided which includes generating a fluid meniscus to process the substrate and applying the fluid meniscus to a surface of the substrate. The method further includes reducing evaporation of fluids from a surface in the substrate processing environment.