The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2009
Filed:
Aug. 11, 2008
Gerard Van Schothorst, Hedel, NL;
Fransiscus Hendrikus Van Deuren, Valkenswaard, NL;
Jan Van Eijk, Eindhoven, NL;
Erik Roelof Loopstra, Heeze, NL;
Robert-han Munnig Schmidt, Hapert, NL;
Felix Godfried Peter Peeters, Lieshout, NL;
Gerard Van Schothorst, Hedel, NL;
Fransiscus Hendrikus Van Deuren, Valkenswaard, NL;
Jan Van Eijk, Eindhoven, NL;
Erik Roelof Loopstra, Heeze, NL;
Robert-Han Munnig Schmidt, Hapert, NL;
Felix Godfried Peter Peeters, Lieshout, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus.