The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2009
Filed:
Nov. 10, 2004
Gary R. Janik, Palo Alto, CA (US);
Eric Bouche, Pleasanton, CA (US);
John Fielden, Los Altos, CA (US);
Gary R. Janik, Palo Alto, CA (US);
Eric Bouche, Pleasanton, CA (US);
John Fielden, Los Altos, CA (US);
KLA-Tencor Technologies Corporation, Milpitas, CA (US);
Abstract
A metrology recipe includes dynamic instructions that allow a metrology tool to perform a secondary metrology operation on a test wafer when previous measurement data indicates a process issue with that test wafer. The metrology recipe can instruct the metrology tool to perform an efficient default metrology operation on all test wafers, and perform a more in-depth secondary metrology operation on only those wafers that warrant additional scrutiny. In this manner, critical metrology data can be captured with a minimum of effect on metrology throughput. The metrology data used to determine whether or not the secondary metrology operation is to be performed can be generated from default metrology operations within the same tool, or can be generated by measurements taken by a completely different tool. Such 'external' metrology data can be received via a communications network, either directly or from a server on the network for processing the metrology data.