The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2009
Filed:
May. 10, 2006
Robert P. Chebi, San Carlos, CA (US);
Jaroslaw W. Winniczek, Daly City, CA (US);
Alan J. Miller, Moraga, CA (US);
Gladys S. Lo, Fremont, CA (US);
Robert P. Chebi, San Carlos, CA (US);
Jaroslaw W. Winniczek, Daly City, CA (US);
Alan J. Miller, Moraga, CA (US);
Gladys S. Lo, Fremont, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
Methods of processing a substrate so as to protect an active area include positioning a substrate in an inductively coupled plasma processing chamber, supplying process gas to the chamber, generating plasma from the process gas and processing the substrate so as to protect the active area by maintaining a plasma potential of about 5 to 15 volts at the substrate surface and/or passivating the active area by using a siliane-free process gas including at least one additive effective to form a protective layer on the active area of the substrate wherein the protective layer includes at least one element from the additive which is already present in the active area.