The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2009
Filed:
Nov. 07, 2003
Yusaku Kashiwagi, Nirasaki, JP;
Yoshihisa Kagawa, Nirasaki, JP;
Kohei Kawamura, Nirasaki, JP;
Gishi Chung, Nirasaki, JP;
Yusaku Kashiwagi, Nirasaki, JP;
Yoshihisa Kagawa, Nirasaki, JP;
Kohei Kawamura, Nirasaki, JP;
Gishi Chung, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A method for forming a porous insulating film includes an insulating film forming step and a hole forming step. During the insulating film forming step, plasma processing of an organic siloxane group compound and an organic compound having a polar group forms an insulating film having a siloxane structure. Molecules of the organic compound having a polar group are contained within this siloxane structure. During the hole forming step, excitation gas removes molecules of the organic compound having a polar group to provide holes in the insulating film. According to this method, an insulating film with a predetermined thickness and holes formed uniformly in the thickness direction can be obtained.