The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2009
Filed:
Sep. 28, 2005
Yi-tyng Wu, Chiayi, TW;
Shih-hung Chen, Hsinchu, TW;
Huai-hsuan Tsai, Tainan, TW;
Chih-hung Cheng, Hsinchu County, TW;
Chien-hua Tsai, Taichung, TW;
Hsuan-hsu Chen, Hsinchu County, TW;
Yi-Tyng Wu, Chiayi, TW;
Shih-Hung Chen, Hsinchu, TW;
Huai-Hsuan Tsai, Tainan, TW;
Chih-Hung Cheng, Hsinchu County, TW;
Chien-Hua Tsai, Taichung, TW;
Hsuan-Hsu Chen, Hsinchu County, TW;
United Microelectronics Corp., Hsinchu, TW;
Abstract
A process for fabricating a micro-display is provided. First, a wafer having a driving circuit thereon is provided. Then, a metallic reflective layer is formed on the wafer. Thereafter, an anti-reflection layer and a patterned photoresist layer are sequentially formed on the metallic reflective layer. Using the patterned photoresist layer as an etching mask, the anti-reflection layer and the metallic reflective layer are etched to form a trench pattern that exposes the surface of the wafer. After that, the patterned photoresist layer is removed. A dielectric layer is formed to cover the anti-reflection layer and fill the trench pattern. Then, a portion of the dielectric layer and the anti-reflection layer are removed to expose the surface of the metallic reflective layer.