The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2009
Filed:
Jul. 28, 2004
Hiroshi Kannan, Hachioji, JP;
Tomio Uno, Osaka, JP;
Ryousuke Dohi, Osaka, JP;
Kouji Nishino, Osaka, JP;
Osamu Nakamura, Osaka, JP;
Atsushi Matsumoto, Osaka, JP;
Nobukazu Ikeda, Osaka, JP;
Hiroshi Kannan, Hachioji, JP;
Tomio Uno, Osaka, JP;
Ryousuke Dohi, Osaka, JP;
Kouji Nishino, Osaka, JP;
Osamu Nakamura, Osaka, JP;
Atsushi Matsumoto, Osaka, JP;
Nobukazu Ikeda, Osaka, JP;
Fujikin Incorporated, Osaka, JP;
Tokyo Electron Ltd., Tokyo, JP;
Abstract
The present invention prevents substantial reduction of flow rate control accuracy in a small flow quantity range, achieves accurate flow rate control over the entire range of flow rate control, and also allows control of a wide pressure range of a chamber with accurate flow rate control. Specifically, a gas supply facility having a plurality of pressure type flow controllers connected in parallel, and a third controller to control operation of the pressure type flow controllers to supply a desired gas exhausted by a vacuum pump to a chamber while controlling its flow rate, is provided wherein one pressure type flow controller is a controller used to control a gas flow rate range up to 10% of the maximum flow rate supplied to the chamber, while the remaining pressure type flow controllers are made to be ones controlling the rest of the gas flow rate range.