The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2009
Filed:
Sep. 29, 2006
Michael A. Graf, Belmont, MA (US);
Edward C. Eisner, Lexington, MA (US);
William F. Divergilio, Brookline, MA (US);
Daniel R. Tieger, Manchester, MA (US);
Michael A. Graf, Belmont, MA (US);
Edward C. Eisner, Lexington, MA (US);
William F. DiVergilio, Brookline, MA (US);
Daniel R. Tieger, Manchester, MA (US);
Axcelis Technologies, Inc., Beverly, MA (US);
Abstract
An ion beam is rapidly switched off during ion implantation on detecting a beam instability. The ion beam is generated or provided by a non-arc discharge based ion source, such as an electron gun ion source or an RF ion source. The ion beam is scanned across a workpiece from a starting location toward an ending location. During the scanning, one or more beam characteristics are monitored, such as beam current, beam flux, shape, and the like. An instability is detected when one or more of the beam characteristics deviate from acceptable values or levels. The ion beam is rapidly turned off on the detected instability.