The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2009
Filed:
Nov. 12, 2004
Sjoerd Nicolaas Lambertus Donders, Hertogenbosch, NL;
Patrick Johannes Cornelus Hendrik Smulders, Best, NL;
Peter Smits, Baarlo, NL;
Sjoerd Nicolaas Lambertus Donders, Hertogenbosch, NL;
Patrick Johannes Cornelus Hendrik Smulders, Best, NL;
Peter Smits, Baarlo, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
In an immersion lithographic apparatus, a closing plate is used to contain liquid in a liquid confinement structure while, for example, substrates are swapped on a substrate table. A closing plate displacement mechanism using, for example, a combination of one or more leaf springs and one or more electromagnets or a combination of one or more linear actuators and one more pins, is used to moving the closing plate toward or from the liquid confinement structure. In an embodiment, an adjustment plate is used to compensate for closing plates of varying thickness in closing plate receptacles of varying depth on different substrate tables.