The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2009
Filed:
Aug. 15, 2006
Dong-chul Yoo, Gyeonggi-do, KR;
Byoung-jae Bae, Gyeonggi-do, KR;
Jang-eun Heo, Seoul, KR;
Ji-eun Lim, Gyeonggi-do, KR;
Dong-hyun Im, Gyeonggi-do, KR;
Dong-Chul Yoo, Gyeonggi-do, KR;
Byoung-Jae Bae, Gyeonggi-do, KR;
Jang-Eun Heo, Seoul, KR;
Ji-Eun Lim, Gyeonggi-do, KR;
Dong-Hyun Im, Gyeonggi-do, KR;
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Abstract
A probe array may be fabricated by forming probes arranged on a sacrificial substrate, forming a probe substrate above the probes, and removing the sacrificial substrate. In one embodiment, first probes may be two-dimensionally formed in row and column directions on a sacrificial substrate. Second probes may be formed between the first probes arranged in the row direction such that a distance between the first and second probes is smaller than the resolution limit in a lithography process. A probe substrate may be formed on the sacrificial substrate having the first and second probes, and the sacrificial substrate may be removed.